{"id":762,"date":"2021-04-25T10:19:25","date_gmt":"2021-04-25T09:19:25","guid":{"rendered":"http:\/\/laserphotonics.uk\/?p=762"},"modified":"2021-04-25T10:21:15","modified_gmt":"2021-04-25T09:21:15","slug":"optimisation-of-ultrafast-laser-assisted-etching-in-fused-silica","status":"publish","type":"post","link":"https:\/\/laserphotonics.uk\/?p=762","title":{"rendered":"Optimisation of ultrafast laser assisted etching in fused silica"},"content":{"rendered":"\n<h2>KOH etching fs laser processing<\/h2>\n\n\n\n<p>\n\n\nAbstract: Ultrafast laser assisted etching (ULAE) in fused silica is an attractive technology<br>for fabricating three-dimensional micro-components. ULAE is a two-step process whereby<br>ultrafast laser inscription (ULI) is first used to modify the substrate material and chemical<br>etching is then used to remove the laser modified material. In this paper, we present a detailed<br>investigation into how the ULI parameters affect the etching rate of laser modified channels<br>and planar surfaces written in fused silica. Recently, potassium hydroxide (KOH) has shown<br>potential to outperform the more commonly used hydrofluoric acid (HF) as a highly selective<br>etchant for ULAE. Here we perform a detailed comparison of HF and KOH etching after laser<br>inscription with a wide range of ultrafast laser irradiation parameters. Etching with KOH is<br>found to be significantly more selective, removing the laser modified material up to 955 times<br>faster than pristine material, compared with up to 66 when using HF. Maximum etching rates<br>for the two etchants were comparable at 320 \u03bcm\/hour and 363 \u03bcm\/hour for HF and KOH<br>respectively. We further demonstrate that highly selective, isotropic etching of non-planar<br>surfaces can be achieved by controlling the polarization state of the laser dynamically during<br>laser inscription. \n<br><\/p>\n\n\n\n<div class=\"wp-block-file\"><a href=\"http:\/\/laserphotonics.uk\/wp-content\/uploads\/2021\/04\/REF_KOH-fs-laser-etching-of-Quartz.pdf\">REF_KOH-fs-laser-etching-of-Quartz<\/a><a href=\"http:\/\/laserphotonics.uk\/wp-content\/uploads\/2021\/04\/REF_KOH-fs-laser-etching-of-Quartz.pdf\" class=\"wp-block-file__button\" download>Download<\/a><\/div>\n","protected":false},"excerpt":{"rendered":"<p>KOH etching fs laser processing Abstract: Ultrafast laser assisted etching (ULAE) in fused silica is an attractive technologyfor fabricating three-dimensional micro-components. ULAE is a two-step process wherebyultrafast laser inscription (ULI) is first used to modify the substrate material and chemicaletching is then used to remove the laser modified material. In this paper, we present a [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":[],"categories":[15],"tags":[],"_links":{"self":[{"href":"https:\/\/laserphotonics.uk\/index.php?rest_route=\/wp\/v2\/posts\/762"}],"collection":[{"href":"https:\/\/laserphotonics.uk\/index.php?rest_route=\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/laserphotonics.uk\/index.php?rest_route=\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/laserphotonics.uk\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/laserphotonics.uk\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=762"}],"version-history":[{"count":1,"href":"https:\/\/laserphotonics.uk\/index.php?rest_route=\/wp\/v2\/posts\/762\/revisions"}],"predecessor-version":[{"id":764,"href":"https:\/\/laserphotonics.uk\/index.php?rest_route=\/wp\/v2\/posts\/762\/revisions\/764"}],"wp:attachment":[{"href":"https:\/\/laserphotonics.uk\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=762"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/laserphotonics.uk\/index.php?rest_route=%2Fwp%2Fv2%2Fcategories&post=762"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/laserphotonics.uk\/index.php?rest_route=%2Fwp%2Fv2%2Ftags&post=762"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}